Lasertec Corporation engages in the designing, manufacturing, and sale of inspection and measurement equipment in Japan and internationally. The company offers semiconductor related products, including Actinic EUV patterned mask inspection system, EUV mask blanks inspection and review system, mask inspection system, mask blanks inspection and review system, EUV pellicle inspection system, EUV mask backside inspection and cleaning system, and mask edge inspection system; phase-shift and transmittance measurement system, phase-shift measurement system; SiC wafer inspection and review system, GaN wafer inspection and review system, high sensitivity under-layer defect inspection and review system, multi-wavelength wafer inspection system, high sensitivity wafer edge inspection system, wafer edge-dimension measurement system, via depth measurement system, TSV back grinding process measurement system, and fully automated wafer measurement system. It also provides FPD photomask inspection system, pellicle inspection and pellicle mounting system for CLIOS, and FPD mask blanks inspection system; and microscopes, such as laser microscopes, electro-chemical reaction visualizing confocal system, and in-situ observation at ultra high temperature confocal scanning laser microscope. The company was formerly known as NJS Corporation and changed its name to Lasertec Corporation in 1986. Lasertec Corporation was founded in 1960 and is headquartered in Yokohama, Japan.